The drainage of thin liquid films between solid surfaces
نویسندگان
چکیده
منابع مشابه
Nonlinear rupture of thin liquid films on solid surfaces.
In this letter we investigate the rupture instability of thin liquid films by means of a bifurcation analysis in the vicinity of the short-scale instability threshold. The rupture time estimate obtained in closed form as a function of the relevant dimensionless groups is in striking agreement with the results of the numerical simulations of the original nonlinear evolution equations. This sugge...
متن کاملThermodynamic Investigations of Thin Liquid Layers Between Solid Surfaces
für Naturforschung in cooperation with the Max Planck Society for the Advancement of Science under a Creative Commons Attribution 4.0 International License. Dieses Werk wurde im Jahr 2013 vom Verlag Zeitschrift für Naturforschung in Zusammenarbeit mit der Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. digitalisiert und unter folgender Lizenz veröffentlicht: Creative Commons Namen...
متن کاملInvestigations of Thin Liquid Layers between Solid
By a special method the disjoining pressure of water caused by a molecular long range orienta tion between fully hydroxylated and highly polished fused silica surfaces at different temperatures (0 — 74 °C) and plate distances ^ 1000 A was determined. Four marked maxima were found at about 15°, 32°, 45°, and 61 °C for not too small plate distances. At these temperatures many authors have detect...
متن کاملIntrinsically Stretchable Biphasic (Solid-Liquid) Thin Metal Films.
Stretchable biphasic conductors are formed by physical vapor deposition of gallium onto an alloying metal film. The properties of the photolithography-compatible thin metal films are highlighted by low sheet resistance (0.5 Ω sq(-1) ) and large stretchability (400%). This novel approach to deposit and pattern liquid metals enables extremely robust, multilayer and soft circuits, sensors, and act...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: The Journal of Chemical Physics
سال: 1985
ISSN: 0021-9606,1089-7690
DOI: 10.1063/1.449693